The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Feb. 15, 2024
Applicant:

Rtx Corporation, Farmington, CT (US);

Inventors:

Jonathan L. Chin, Morrisville, NC (US);

Andrew S. Miller, Marlborough, CT (US);

Justin C. Pratt, Marlborough, CT (US);

David J. Wasserman, Hamden, CT (US);

Assignee:

RTX Corporation, Farmington, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F01D 5/28 (2006.01);
U.S. Cl.
CPC ...
F01D 5/282 (2013.01); F05D 2240/80 (2013.01); F05D 2300/601 (2013.01); F05D 2300/6033 (2013.01);
Abstract

CMC yarn is formed on the outer surface of a mandrel, generally tracking the shape of the mandrel outer shape. CMC fabric layers are formed outwardly of the shear tube to form a desired shape of a final airfoil leading edge. The mandrel, and the shear tube are provided with a shape at at least one of the mandrel radially inner and outer ends to be spaced from the desired final shape of the airfoil leading edge at a corresponding one of a fabric radially inner and outer ends. A filler material is inserted into a space between the corresponding one of a fabric radially inner end and a fabric radially outer end of the fabric layers.


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