The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Jul. 08, 2022
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Yunosuke Sakai, Toyama, JP;

Takashi Ozaki, Toyama, JP;

Keigo Nishida, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45578 (2013.01); C23C 16/4412 (2013.01); C23C 16/45506 (2013.01); C23C 16/45517 (2013.01); C23C 16/45519 (2013.01); C23C 16/45574 (2013.01); C23C 16/4583 (2013.01);
Abstract

There is provided a technique that includes a first nozzle configured to supply a process gas to a process chamber that processes a substrate, a second nozzle arranged to be spaced apart by a predetermined distance from the first nozzle in a circumferential direction of the substrate and configured to supply an inert gas to the process chamber, and a reaction container defining the process chamber therein and including a first protrusion protruding outward to accommodate the first nozzle and a second protrusion protruding outward to accommodate the second nozzle.


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