The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Feb. 24, 2023
Applicants:

SK Specialty Co., Ltd., Yeongju-si, KR;

Industry-university Cooperation Foundation Hanyang University Erica Campus, Ansan-si, KR;

Inventors:

Sungwoong Chung, Sejong-si, KR;

Junghun Kawk, Sejong-si, KR;

Jihun Lee, Sejong-si, KR;

Woohee Kim, Ansan-si, KR;

Jeongmin Lee, Ansan-si, KR;

Seohyun Lee, Ansan-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/042 (2013.01); C23C 16/45525 (2013.01);
Abstract

There is provided a substrate processing method. The method includes providing a substrate having a first surface area and a second surface area having a different surface state than that of the first surface area, exposing the substrate to a substrate surface treatment composition containing a deposition inhibitor, and exposing the substrate to a post-treatment composition containing HF.


Find Patent Forward Citations

Chung, Sungwoong. (2026). Substrate processing method and selective deposition method using the same (U.S. Patent No. 12601047). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12601047

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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