The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2026
Filed:
Oct. 08, 2021
Applicant:
3m Innovative Properties Company, St. Paul, MN (US);
Inventors:
Jeffrey O. Emslander, Grant, MN (US);
Huiwen Tai, Lake Elmo, MN (US);
John A. Nielsen, Woodbury, MN (US);
Assignee:
3M Innovative Properties Company, St. Paul, MN (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09J 7/29 (2018.01); B32B 7/06 (2019.01); B32B 7/12 (2006.01); B32B 27/08 (2006.01); B32B 27/30 (2006.01); B32B 27/32 (2006.01); B32B 27/34 (2006.01); B32B 27/36 (2006.01); B32B 27/40 (2006.01); C09J 133/08 (2006.01);
U.S. Cl.
CPC ...
C09J 7/29 (2018.01); B32B 7/06 (2013.01); B32B 7/12 (2013.01); B32B 27/08 (2013.01); B32B 27/306 (2013.01); B32B 27/308 (2013.01); B32B 27/32 (2013.01); B32B 27/34 (2013.01); B32B 27/36 (2013.01); B32B 27/40 (2013.01); C09J 133/08 (2013.01); B32B 2250/05 (2013.01); B32B 2250/24 (2013.01); B32B 2250/40 (2013.01); B32B 2307/412 (2013.01); B32B 2307/414 (2013.01); B32B 2307/7376 (2023.05); B32B 2307/748 (2013.01); C09J 2301/122 (2020.08); C09J 2467/006 (2013.01); C09J 2477/006 (2013.01);
Abstract
A film stack is described. In particular, a film stack that includes a co-extrudable first base substrate, a first pressure sensitive adhesive, a release layer, a second pressure sensitive adhesive, and a second base substrate is described. Such film stacks may benefit from reduced waste, simpler manufacturing, and a thinner overall construction versus conventional film stacks.