The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Dec. 06, 2022
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Fen Wan, Austin, TX (US);

Weijun Liu, Cedar Park, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/22 (2006.01); C08G 77/18 (2006.01); C09D 183/08 (2006.01);
U.S. Cl.
CPC ...
C08G 77/22 (2013.01); C08G 77/18 (2013.01); C09D 183/08 (2013.01);
Abstract

A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one silicon-containing monomer having a structure of formula (1)


Find Patent Forward Citations

Wan, Fen. (2026). Photocurable composition with high silicon content (U.S. Patent No. 12600820). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12600820

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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