The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

Nov. 16, 2020
Applicant:

Sumco Corporation, Tokyo, JP;

Inventors:

Yu Minamide, Tokyo, JP;

Naoyuki Wada, Tokyo, JP;

Assignee:

SUMCO CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/24 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68742 (2013.01); C23C 16/24 (2013.01); C23C 16/4583 (2013.01); C23C 16/52 (2013.01);
Abstract

A vapor deposition device is provided that can suppress an influence on an epitaxial layer which is caused by a position of a lift pin without adjusting an upper and lower heating ratio of a wafer. A reaction chamber is provided with a susceptor on which a carrier is placed, and a carrier lift pin which moves the carrier vertically relative to the susceptor; and the carrier lift pin is installed outside of an outer edge of the wafer when a state where the carrier supporting the wafer is mounted on the susceptor is viewed in a plan view.


Find Patent Forward Citations

Minamide, Yu. (2026). Vapor deposition device and vapor deposition method (U.S. Patent No. 12598956). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12598956

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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