The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

Jul. 27, 2023
Applicant:

Saint-gobain Ceramics & Plastics, Inc., Worcester, MA (US);

Inventors:

Renjie Zhou, Alhambra, CA (US);

Lin Fu, Rancho Palos Verdes, CA (US);

Chun-Lung Kuan, Anaheim, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10P 52/40 (2026.01); C09G 1/02 (2006.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
H10P 52/403 (2026.01); C09G 1/02 (2013.01); C09K 3/1409 (2013.01);
Abstract

In one embodiment, a polishing composition can comprise abrasive particles including zirconia, an oxidizing agent including hydroxylamine and water. The polishing composition can have a high copper removal rate of at least 3500 Å/min, and a polishing selectivity of copper to silicon dioxide(Cu:SiO) can be at least 2.5:1. In another embodiment, a combination product can comprise a first polishing composition and a second polishing composition, wherein each of the first polishing composition and the second polishing composition can comprise abrasive particles including zirconia and an oxidizing agent including hydroxylamine, wherein a hydroxylamine weight % ratio of the first polishing composition to the second polishing composition may be at least 5:1.


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Zhou, Renjie. (2026). Composition and method for conducting a material removing operation (U.S. Patent No. 12598935). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12598935

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