The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

Aug. 08, 2022
Applicant:

Auo Corporation, Hsinchu, TW;

Inventors:

Yang-Shun Fan, Hsinchu, TW;

Chen-Shuo Huang, Hsinchu, TW;

Assignee:

AUO Corporation, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 86/40 (2025.01); H10D 30/01 (2025.01); H10D 30/69 (2025.01); H10D 86/01 (2026.01); H10D 86/60 (2025.01);
U.S. Cl.
CPC ...
H10D 86/431 (2025.01); H10D 30/0415 (2025.01); H10D 30/701 (2025.01); H10D 86/021 (2025.01); H10D 86/423 (2025.01); H10D 86/60 (2025.01);
Abstract

An active device substrate includes a substrate, a first semiconductor device and a second semiconductor device. The first semiconductor device and the second semiconductor device are disposed above the substrate. The first semiconductor device includes a first gate, a first semiconductor layer, a first source and a first drain. A first gate dielectric structure is sandwiched between the first gate and the first semiconductor layer. The first gate dielectric structure includes a stack of a portion of a gate dielectric layer and a portion of a ferroelectric material layer. The second semiconductor device is electrically connected to the first semiconductor device and includes a second gate, a second semiconductor layer, a second source and a second drain. Another part of the ferroelectric material layer is sandwiched between the second gate and the second semiconductor layer.


Find Patent Forward Citations

Fan, Yang-Shun. (2026). Thin film transistors having ferroelectric material for providing pixel compensation (U.S. Patent No. 12598807). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12598807

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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