The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2026
Filed:
Sep. 15, 2023
Hon Hai Precision Industry Co., Ltd., New Taipei City, TW;
Hon Young Semiconductor Corporation, Hsinchu City, TW;
Yi-Kai Hsiao, New Taipei City, TW;
Kuang-Hao Chiang, Hsinchu City, TW;
Hao-Chung Kuo, New Taipei City, TW;
HON HAI PRECISION INDUSTRY CO., LTD., New Taipei City, TW;
Hon Young Semiconductor Corporation, Hsinchu City, TW;
Abstract
A semiconductor device includes a substrate, an epitaxial layer, a well region, a source region, a base region, a first JFET region, a second JFET region, a gate dielectric layer and a gate layer. The epitaxial layer is at a side of the substrate. The well region is in the epitaxial layer. The source region is in the well region. The base region is in the well region and adjacent to the source region. The first JFET region is adjacent to the well region. The second JFET region is in the first JFET region. A doping concentration of the second JFET region is higher than a doping concentration of the first JFET region. The gate dielectric layer is at a side of the epitaxial layer away from the substrate. The gate layer is at a side of the gate dielectric layer away from the epitaxial layer.