The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

May. 04, 2021
Applicant:

3m Innovative Properties Company, St. Paul, MN (US);

Inventors:

Carl A. Stover, St. Paul, MN (US);

Lin Zhao, Woodbury, MN (US);

Gilles J. Benoit, Minneapolis, MN (US);

Robert D. Taylor, Stacy, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); B32B 27/08 (2006.01); B32B 27/36 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
G02B 5/305 (2013.01); B32B 27/08 (2013.01); B32B 27/36 (2013.01); B32B 27/365 (2013.01); B32B 2250/05 (2013.01); B32B 2250/24 (2013.01); B32B 2307/42 (2013.01); B32B 2307/732 (2013.01); B32B 2551/00 (2013.01); G02F 1/13338 (2013.01);
Abstract

An optical film includes a plurality of polymeric layers. A plot of an average layer thickness versus a layer number of the polymeric layers includes a knee region separating a left region including at least N1 sequentially arranged polymeric layers where the polymeric layers have lower layer numbers from a middle region including at least N2 sequentially arranged polymeric layers where the polymeric layers have higher layer numbers. N1 is greater than about 50 and N2 is greater than about 10. A linear fit to the at least N1 sequentially arranged polymeric layers in the left region has a positive linear slope having a magnitude of greater than about 0.04 nm per layer number, and a linear fit to the at least N2 sequentially arranged polymeric layers in the middle region has a negative linear slope having a magnitude of greater than about 0.05 nm per layer number.


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