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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12595622 B1

PDFFull Text
Date of Patent:
Apr. 07, 2026

Filed:

Mar. 20, 2024

Fabric substrate and manufacturing method thereof

Applicant:

Korea Advanced Institute of Science and Technology, Daejeon, KR;

Inventors:

Kyung Cheol Choi, Daejeon, KR;

Seung Yeop Choi, Daejeon, KR;

Seon Il Kwon, Daejeon, KR;

Assignee:

Korea Advanced Institute of Science and Technology, Daejeon, KR;

Attorney:

The Webb Law Firm

Primary Examiner:

Alex A Rolland

Int. Cl.
CPC ...
D06N 3/18 (2006.01); D06N 3/00 (2006.01); D06N 3/04 (2006.01); D06N 3/12 (2006.01); D06N 3/14 (2006.01); G09F 21/02 (2006.01); H10K 71/80 (2023.01); H10K 77/10 (2023.01);
U.S. Cl.
CPC ...
D06N 3/18 (2013.01); D06N 3/0006 (2013.01); D06N 3/0081 (2013.01); D06N 3/042 (2013.01); D06N 3/123 (2013.01); D06N 3/128 (2013.01); D06N 3/14 (2013.01); G09F 21/026 (2013.01); H10K 71/80 (2023.02); H10K 77/111 (2023.02); D06N 2203/045 (2013.01); D06N 2203/061 (2013.01); D06N 2203/068 (2013.01); D06N 2205/20 (2013.01); D06N 2207/123 (2013.01); D06N 2209/106 (2013.01); D06N 2209/1635 (2013.01);
Abstract

According to the present invention, there is provided a fabric substrate for mounting a light emitting element. The fabric substrate comprises a fabric layer including at least one fabric, a stress buffer layer that is disposed on the fabric layer and minimizes an occurrence of physical strain and stress caused by bending the fabric layer, and a flattening layer that is disposed on the stress buffer layer and provides a flat surface to allow a light emitting element to operate.

Find Patent Forward Citations

Choi, Kyung. (2026). Fabric substrate and manufacturing method thereof (U.S. Patent No. 12595622). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12595622

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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