The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

Mar. 14, 2022
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Yoshinori Itoh, Kanagawa, JP;

Tatsuaki Orihara, Tokyo, JP;

Shinichi Sakurada, Tokyo, JP;

Tsutomu Shiratori, Tokyo, JP;

Sachiko Yamauchi, Kanagawa, JP;

Nobuyuki Kuwabara, Tokyo, JP;

Futoshi Hirose, Kanagawa, JP;

Takeshi Okada, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01L 3/00 (2006.01); B01L 1/00 (2006.01); B01L 7/00 (2006.01); C12N 15/87 (2006.01);
U.S. Cl.
CPC ...
C12N 15/87 (2013.01); B01L 3/56 (2013.01); B01L 7/00 (2013.01); B01L 2200/0647 (2013.01); B01L 2300/18 (2013.01); B01L 2400/0605 (2013.01);
Abstract

Provided is a compound introduction apparatus including: a processing chamber; a first heater that introduces an introduction-target compound into a cell inside the processing chamber; a supply flow channel for supplying a cell suspension containing the cell and the introduction-target compound to the processing chamber; a discharge flow channel for discharging the cell suspension from the processing chamber; a second heater that prevents backflow of the cell suspension from the processing chamber into the supply flow channel; and a third heater that pressurizes the discharge flow channel.


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