The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

Feb. 06, 2023
Applicant:

Mitsubishi Heavy Industries, Ltd., Tokyo, JP;

Inventors:

Atsushi Tanaka, Tokyo, JP;

Yoshio Seiki, Tokyo, JP;

Shuntaro Seto, Tokyo, JP;

Hideki Ito, Tokyo, JP;

Hidekazu Nishino, Tokyo, JP;

Ichirou Toyoda, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 3/0073 (2026.01); B01J 7/02 (2006.01); B01J 20/02 (2006.01); C01B 3/042 (2026.01); C01B 3/065 (2026.01);
U.S. Cl.
CPC ...
C01B 3/0073 (2013.01); B01J 7/02 (2013.01); B01J 20/0248 (2013.01); C01B 3/042 (2013.01); C01B 3/065 (2013.01);
Abstract

A hydrogen production system includes: a hydrogen compound slurry in which a hydrogen compound member is suspended in a solvent containing water; a first vessel; a second vessel having an internal temperature higher than that of the first vessel; a first passage connecting the first vessel and the second vessel; and a second passage connecting the first vessel and the second vessel and different from the first passage. The hydrogen production system is configured to allow the hydrogen compound slurry contained in the first vessel to move into the second vessel through the first passage, and the hydrogen compound slurry contained in the second vessel to move into the first vessel through the second passage.


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