The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

Mar. 08, 2021
Applicant:

Nikon Slm Solutions Ag, Luebeck, DE;

Inventor:

Daniel Alberts, Luebeck, DE;

Assignee:

Nikon SLM Solutions AG, Luebeck, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B22F 10/85 (2021.01); B22F 10/28 (2021.01); B22F 10/366 (2021.01); G06F 30/20 (2020.01); B22F 12/90 (2021.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01);
U.S. Cl.
CPC ...
B22F 10/85 (2021.01); B22F 10/28 (2021.01); B22F 10/366 (2021.01); G06F 30/20 (2020.01); B33Y 10/00 (2014.12); B33Y 50/02 (2014.12);
Abstract

We describe a system for simulating process monitoring by a sensor system in an additive layer manufacturing, in particular selective laser melting, process used to solidify material from which a three-dimensional workpiece is to be produced, wherein the system comprises: a data input coupleable to a data output of the sensor system and configured to receive, from the sensor system, sensor data relating to the process monitored by the sensor system, wherein the data input is further configured to receive one or more input parameters (i) relating to the additive layer manufacturing process and/or (ii) associated with an additive layer manufacturing apparatus used for the additive layer manufacturing process and/or (iii) associated with the process monitoring and/or the sensor system; and a processing unit coupled to the data input and configured to generate, from the sensor data and the one or more input parameters, a model for simulating said process monitoring.


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