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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12594147 B1

PDFFull Text
Date of Patent:
Apr. 07, 2026

Filed:

Jun. 06, 2024

Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom

Applicant:

Align Technology, Inc., San Jose, CA (US);

Inventors:

Robert Liska, Schleinbach, AT;

Christian Gorsche, Vienna, AT;

Gyorgy Harakaly, Vienna, AT;

Markus Kury, Vienna, AT;

Jurgen Stampfl, Vienna, AT;

Peter Dorfinger, Los Altos Hills, CA (US);

Yan Chen, Cupertino, CA (US);

Chunhua Li, Cupertino, CA (US);

Srinivas Kaza, Mountain View, CA (US);

Assignee:

Align Technology, Inc., San Jose, CA (US);

Attorney:

Seed Intellectual Property Law Group LLP

Primary Examiner:

Jessica M Roswell

Int. Cl.
CPC ...
A61C 7/08 (2006.01); A61C 7/10 (2006.01); B22F 10/12 (2021.01); B22F 10/20 (2021.01); B22F 10/38 (2021.01); B22F 10/60 (2021.01); C08G 18/10 (2006.01); C08G 18/32 (2006.01); C08G 18/34 (2006.01); C08G 18/44 (2006.01); C08G 18/73 (2006.01); C08G 18/75 (2006.01); C08G 18/81 (2006.01); C08J 5/00 (2006.01);
U.S. Cl.
CPC ...
A61C 7/08 (2013.01); A61C 7/10 (2013.01); B22F 10/12 (2021.01); C08G 18/10 (2013.01); C08G 18/3206 (2013.01); C08G 18/3212 (2013.01); C08G 18/348 (2013.01); C08G 18/44 (2013.01); C08G 18/73 (2013.01); C08G 18/755 (2013.01); C08G 18/815 (2013.01); C08J 5/00 (2013.01); B22F 10/20 (2021.01); B22F 10/38 (2021.01); B22F 10/60 (2021.01); C08J 2375/04 (2013.01);
Abstract

Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

Find Patent Forward Citations

Liska, Robert. (2026). Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom (U.S. Patent No. 12594147). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12594147

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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