The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

Dec. 15, 2020
Applicant:

Essilor International, Charenton-le-Pont, FR;

Inventors:

Stephane Boutinon, Charenton-le-Pont, FR;

Estelle Netter, Charenton-le-Pont, FR;

Martha Hernandez-Castaneda, Charenton-le-Pont, FR;

Konogan Baranton, Charenton-le-Pont, FR;

Gildas Marin, Charenton-le-Pont, FR;

Assignee:

Essilor International, Charenton-le-Pont, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 3/032 (2006.01); A61B 3/00 (2006.01); A61B 3/08 (2006.01);
U.S. Cl.
CPC ...
A61B 3/032 (2013.01); A61B 3/0033 (2013.01); A61B 3/005 (2013.01); A61B 3/08 (2013.01);
Abstract

A system for determining refraction features of both first and second eyes of a subject including a light field display device, a system of localization of the positions of the first and second eyes of the subject, the light field display device generating a first light field directed selectively toward the first eye, and, respectively, a second light field directed selectively toward the second eye, control circuitry that adjusts the first light field as a function of at least a first refraction parameter associated with at least a first optical aberration for the first eye and the control circuitry adjusting said second light field as a function of at least a second refraction parameter associated with at least a second optical aberration for the second eye.


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