The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2026

Filed:

Oct. 18, 2022
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Harish Kumar Premakumar, Bengaluru, IN;

Tongtong Guo, Beaverton, OR (US);

Rachel E. Batzer, Tigard, OR (US);

Bo Gong, Sherwood, OR (US);

Francisco J. Juarez, West Linn, OR (US);

Ching-Yun Chang, West Linn, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 1/40 (2024.01); B08B 5/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67017 (2013.01); B08B 1/40 (2024.01); B08B 5/02 (2013.01); H01L 21/67161 (2013.01);
Abstract

Disclosed are various systems that allow for plasma delivery from a central location in a multi-station processing chamber to be redirected to different processing stations within the chamber. Such systems may include a deflector plate that is mounted to a wafer indexer such that the deflector plate is centered on the wafer indexer. In other implementations, such systems may include a deflector plate that is mounted in a fixed relationship with a ceiling of the processing chamber. The deflector plate may have a body having a top surface and an underside surface that are on opposite sides of the body. A plurality of recesses may be arranged across the top surface in a radial pattern around a center axis.


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