The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2026

Filed:

Mar. 24, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sunhye Hwang, Suwon-si, KR;

Sung Gi Kim, Daejeon, KR;

Jihyun Lee, Suwon-si, KR;

Yujin Cho, Daejeon, KR;

Seung Son, Daejeon, KR;

Gyun Sang Lee, Daejeon, KR;

Younjoung Cho, Suwon-si, KR;

Byungkeun Hwang, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02216 (2013.01); C23C 16/401 (2013.01); C23C 16/4408 (2013.01); C23C 16/45553 (2013.01); H01L 21/02164 (2013.01);
Abstract

Provided are a silicon precursor having a heterocyclic group, a composition for depositing a silicon-containing layer including the same, and a method of depositing a silicon-containing layer using the same. The silicon precursor is represented by Formula 1. In Formula 1, Ais a heterocyclic group including one or more nitrogen, and Ris hydrogen or an alkyl group of 1˜6 carbon atoms. Rand Rmay be each independently an alkyl group of 1˜6 carbon atoms.


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