The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2026

Filed:

Sep. 26, 2022
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Oscar Van Der Straten, Guilderland Center, NY (US);

Shanti Pancharatnam, Albany, NY (US);

Chih-Chao Yang, Glenmont, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10N 50/80 (2023.01); G11B 5/39 (2006.01); H10B 61/00 (2023.01); H10N 50/01 (2023.01); H10N 50/10 (2023.01); G11C 11/16 (2006.01);
U.S. Cl.
CPC ...
H10N 50/10 (2023.02); G11B 5/3909 (2013.01); H10B 61/00 (2023.02); H10N 50/01 (2023.02); H10N 50/80 (2023.02); G11C 11/161 (2013.01); G11C 2211/5615 (2013.01);
Abstract

A semiconductor device including a magnetic tunnel junction (MTJ) stack vertically aligned between an annular shaped bottom electrode and an annular shaped top electrode. A semiconductor device including a MTJ stack, vertically aligned between an annular shaped bottom electrode and an annular shaped top electrode, and an encapsulation layer surrounding vertical side surfaces of the MTJ stack, wherein the encapsulation layer does not surround the top electrode nor the bottom electrode. Forming a bottom electrode in a first inter-layer dielectric, forming a reference layer on the first inter-layer dielectric and on the bottom electrode, forming a tunnel barrier layer on the reference layer, forming a free layer on the tunnel barrier layer and patterning the reference layer, the tunnel barrier layer and the free layer into a magnetic tunnel function (MTJ) stack vertically aligned over the bottom electrode, while not patterning the bottom electrode nor the first inter-layer dielectric.


Find Patent Forward Citations

Quick Actions:

Van Der Straten, Oscar. (2026). Mram device with annular electrodes (U.S. Patent No. 12593614). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12593614

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