The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2026
Filed:
Oct. 14, 2021
Beijing Xiaomi Mobile Software Co., Ltd., Beijing, CN;
Liangang Chi, Beijing, CN;
Dong Chen, Beijing, CN;
BEIJING XIAOMI MOBILE SOFTWARE CO., LTD., Beijing, CN;
Abstract
A metasurface unit includes a metal radiation patch with a gap, an upper-layer dielectric plate, a metal ground layer, a lower-layer dielectric plate, and a feed structure arranged in sequence from top to bottom. One end of the feed structure is connected to the metal radiation patch, and another end of the feed structure is arranged on a bottom layer of the lower-layer dielectric plate through a feed through hole. The feed through hole passes through the upper-layer dielectric plate, the metal ground layer and the lower-layer dielectric plate in turn. The metal radiation patch is rotatable around a central axis. Different included angles between the gap and a positive direction of an X-axis correspond to different polarization states.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile