The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2026
Filed:
Aug. 05, 2024
Applicant:
Dell Products L.p., Hopkinton, MA (US);
Inventors:
Peter Callewaert, Eernegem, BE;
Dennis Trulli, Jr., Hudson, MA (US);
Assignee:
Dell Products L.P., Hopkinton, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 11/00 (2006.01); G06F 11/14 (2006.01); G06F 11/20 (2006.01);
U.S. Cl.
CPC ...
G06F 11/1438 (2013.01); G06F 11/2071 (2013.01);
Abstract
SQAR site and region swap sequences include a combination of full swap and half swap commands to avoid creating a cascaded R21 while reducing elongated RDF resume processing. This is accomplished by limiting the use of half swap commands to mirrors that do not have an RDF resume command in the affected swap sequence and that require half swap to avoid creation of a cascaded R21. Changing the replication direction for the other mirrors, if necessary in the context of a site or region swap sequence, is done using full swap commands, thus enabling fast RDF resume processing on those legs.