The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2026

Filed:

Oct. 25, 2021
Applicant:

Nitto Denko Corporation, Ibaraki, JP;

Inventors:

Satoshi Yasui, Ibaraki, JP;

Katsunori Shibuya, Ibaraki, JP;

Kazuhiro Nakajima, Ibaraki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01L 1/22 (2006.01); C23C 14/00 (2006.01); C23C 14/06 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
G01L 1/2287 (2013.01); C23C 14/0036 (2013.01); C23C 14/0641 (2013.01); C23C 14/34 (2013.01);
Abstract

A functional film includes a strain resistance film provided on one principal surface of a flexible insulating base. The strain resistance film is a chromium nitride thin-film having a thickness of 150 nm or less. In an X-ray diffraction chart with a CuKα ray as an X-ray source, the strain resistance film has an intensity ratio I/Iof 0.001 or more, where the intensity ratio I/Iis a ratio of the intensity Iof the second peak in a range in which 2θ is 60° to 65° to the intensity Iof the first peak in a range in which 2θ is 43° to 45°. The strain resistance film is less liable to crack due to bending, and has a high gauge factor. The functional film is suitably used for a strain sensor.


Find Patent Forward Citations

Yasui, Satoshi. (2026). Strain sensor, functional film, and method for manufacturing same (U.S. Patent No. 12590855). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12590855

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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