The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2026
Filed:
May. 16, 2023
Curiox Biosystems Pte Ltd., Singapore, SG;
Kong Leong Cheng, Singapore, SG;
Namyong Kim, Goyang, KR;
CURIOX BIOSYSTEMS PTE LTD., Singapore, SG;
Abstract
A method for washing particles includes obtaining an array plate that includes an array of hydrophilic areas surrounded by one or more hydrophobic areas. A respective solution containing a sample is located on a respective hydrophilic area of the array of hydrophilic areas. The respective hydrophilic area includes one or more indentations from a respective surrounding hydrophobic area of the one or more hydrophobic areas. The respective hydrophilic area includes a first indented surface that is offset from a reference surface defined by the respective surrounding hydrophobic area. The method also includes placing an aspirator nozzle above the respective hydrophilic area at a predefined distance from the first indented surface, and aspirating the solution with the aspirator nozzle while the aspirator nozzle is located at the predefined distance from the first indented surface.