The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2026

Filed:

May. 11, 2022
Applicants:

Samsung Sdi Co., Ltd., Yongin-si, KR;

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Ran Namgung, Suwon-si, KR;

Hyeon Park, Suwon-si, KR;

Shinhyo Bae, Suwon-si, KR;

Daeseok Song, Suwon-si, KR;

Minki Chon, Suwon-si, KR;

Jun Soo Kim, Hwaseong-si, KR;

Hyun-Woo Kim, Seongnam-si, KR;

Hyun-Ji Song, Anyang-si, KR;

Young Joo Choi, Hwaseong-si, KR;

Suk-Koo Hong, Hwaseong-si, KR;

Assignees:

Samsung SDI Co., Ltd., Yongin-si, KR;

Samsung Electronics Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 167/04 (2006.01); C07C 31/38 (2006.01); C07C 37/02 (2006.01); C07C 323/03 (2006.01); C07D 285/15 (2006.01); C08G 63/47 (2006.01); C08G 63/682 (2006.01); G03F 7/004 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
C09D 167/04 (2013.01); C07C 31/38 (2013.01); C07C 37/02 (2013.01); C07C 323/03 (2013.01); C07D 285/15 (2013.01); C08G 63/47 (2013.01); C08G 63/6822 (2013.01); G03F 7/0041 (2013.01); G03F 7/168 (2013.01);
Abstract

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent


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