The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2026

Filed:

Jan. 26, 2024
Applicant:

Device Co., Ltd., Chungcheongnam-do, KR;

Inventor:

Taek Youb Lee, Cheonan, KR;

Assignee:

DEVICE CO., LTD., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01); B08B 13/00 (2006.01);
U.S. Cl.
CPC ...
B08B 3/02 (2013.01); B08B 13/00 (2013.01); B08B 2203/0211 (2013.01);
Abstract

The present disclosure relates to a substrate treatment apparatus including: a substrate treatment apparatus including: a chuck base rotating together with a substrate in a state of supporting the substrate thereagainst; a fluid supply unit for supplying treatment liquid to the substrate; a bowl assembly having a plurality of bowls that overlap outward in a radial direction with respect to the center of the substrate in such a way as to surround the chuck base; an ascending and descending unit for moving the bowl assembly up and down; and a shutter unit disposed on top of the outermost bowl of the bowl assembly to adjust a radius of an air flow inlet through which air flow passes toward the substrate.


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Lee, Taek. (2026). Substrate treatment apparatus (U.S. Patent No. 12589415). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12589415

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