The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2026

Filed:

May. 27, 2021
Applicant:

Danmarks Tekniske Universitet, Kongens Lyngby, DK;

Inventors:

Yiyu Ou, Kongens Lyngby, DK;

Paul Michael Petersen, Kongens Lyngby, DK;

Assignee:

DANMARKS TEKNISKE UNIVERSITET, Congens Lyngby, DK;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61C 8/00 (2006.01); C23F 1/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
A61C 8/0037 (2013.01); C23F 1/02 (2013.01); A61C 2008/0046 (2013.01); H01J 37/321 (2013.01); H01J 2237/3341 (2013.01);
Abstract

A method for formation of monolithic nanostructures on an implantable device includes: a. depositing a metal film to a surface of the implantable device; b. heating the metal film for a period of time, such that the metal film transforms into multiple discrete nanoparticles, the multiple nanoparticles thereby forming an etch mask on the surface of the implantable device; c. etching the implantable device such that the surface of the implantable device is etched through the etch mask, thereby forming monolithic nanostructures in the surface of the implantable device; and d. (optionally) removing the etch mask, such as by immersion in an aqua regia solution.


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