The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Jul. 28, 2022
Samsung Electronics Co., Ltd., Suwon-si, KR;
Hae Won Choi, Daejeon, KR;
Seung Min Shin, Suwon-si, KR;
Sang Jine Park, Suwon-si, KR;
Jae Won Shin, Suwon-si, KR;
Ji Hwan Park, Hwaseong-si, KR;
Kun Tack Lee, Suwon-si, KR;
Koriakin Anton, Cheonan-si, KR;
Joon Ho Won, Suwon-si, KR;
Pil Kyun Heo, Yongin-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
SEMES CO., LTD., Cheonan-si, KR;
Abstract
A substrate processing apparatus and a substrate processing method are provided, in which a flow rate of COinjected into a supercritical drying vessel is controlled through multi-level pressure control. The substrate processing method includes disposing a substrate coated with a chemical liquid in a process chamber, that includes a space in which the substrate is processed; drying the substrate by using a supercritical fluid; and taking the substrate out of the process chamber when the substrate is dried.