The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Feb. 12, 2021
Applicant:
Metoxtechnologies, Inc., Houston, TX (US);
Inventors:
Shahab Khandan, Houston, TX (US);
Alex Ignatiev, Houston, TX (US);
Mikhail Novozhilov, Houston, TX (US);
W. James Jewitt, Houston, TX (US);
Assignee:
MetOx International, Inc., Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C23C 16/52 (2006.01); C23C 16/54 (2006.01); H10N 60/01 (2023.01);
U.S. Cl.
CPC ...
H10N 60/0464 (2023.02); C23C 16/4412 (2013.01); C23C 16/4586 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); C23C 16/545 (2013.01);
Abstract
A susceptor used in a deposition reactor provides heat input and controls the build-up of errant deposition. The susceptor heats a substrate tape within the reactor upon which one or more thin films are deposited, particularly high temperature superconductor (HTS) thin films produced in a MOCVD reactor.
Khandan, Shahab. (2026). Susceptor for a chemical vapor deposition reactor (U.S. Patent No. 12588426). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12588426
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile