The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

Dec. 13, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Oscar Van Der Straten, Guilderland Center, NY (US);

Lisamarie White, Staatsburg, NY (US);

Willie Lester Muchrison, Jr., Troy, NY (US);

Scott A. Devries, Albany, NY (US);

Daniel Charles Edelstein, White Plains, NY (US);

Michael Rizzolo, Delmar, NY (US);

Chih-Chao Yang, Glenmont, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10N 50/01 (2023.01); H10B 61/00 (2023.01); H10N 50/80 (2023.01);
U.S. Cl.
CPC ...
H10N 50/01 (2023.02); H10B 61/00 (2023.02); H10N 50/80 (2023.02);
Abstract

Embodiments of the invention are directed to an integrated circuit (IC) structure that includes a memory element a non-sacrificial hardmask stack over the memory element. The non-sacrificial hardmask stack includes a first hardmask region and a second hardmask region. A compressive stress level of the first hardmask region is greater than a compressive stress level of the second hardmask region.


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