The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

Aug. 10, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Shreeram Jyoti Dash, San Jose, CA (US);

Michael Thomas Nichols, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3299 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/3341 (2013.01);
Abstract

Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a method for waveform generation, which generally includes delivering a first waveform with an associated setpoint from an energy source; detecting at least one characteristic of the first waveform; estimating a voltage decay during a portion of a pulse during the first waveform; calculating a compensation factor; and adjusting the at least one characteristic using the compensation factor to adjust a voltage decay.


Find Patent Forward Citations

Dash, Shreeram. (2026). Pulsed voltage compensation for plasma processing applications (U.S. Patent No. 12586768). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12586768

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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