The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

Feb. 08, 2023
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventors:

Yoshio Takahashi, Tokyo, JP;

Tetsuya Akashi, Tokyo, JP;

Toshiaki Tanigaki, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/26 (2013.01); H01J 37/222 (2013.01); H01J 2237/2614 (2013.01);
Abstract

There is provided a phase-image processing apparatus and a phase-image processing method capable of highly accurately correcting a phase singularity included in a phase image. A phase-image processing apparatus that applies image processing to a phase image includes: a fringe pattern-creating unit that creates a plurality of fringe patterns based on a first interference fringe image corresponding to a first phase image including a phase singularity; a patch image-creating unit that creates a patch image based on the fringe pattern; an interference fringe image correcting unit that pastes the patch image to an area of the first interference fringe image corresponding to the phase singularity, corrects the first interference fringe image, and creates a second interference fringe image; and a phase image correcting unit that creates a second phase image from the second interference fringe image.


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