The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Mar. 09, 2022
Applicant:
Samsung Display Co., Ltd., Yongin-si, KR;
Inventors:
Yong Hwan Ryu, Yongin-si, KR;
Sang Jin Park, Yongin-si, KR;
Sa Rah Lee, Cheonan-si, KR;
Sung Bae Ju, Hwaseong-si, KR;
Assignee:
SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
G03F 7/168 (2013.01); H10P 72/0474 (2026.01);
Abstract
A photolithography apparatus includes a cleaning unit which cleans a target substrate, a drying unit which dries the target substrate provided from the cleaning unit, and a coating unit which forms a photoresist layer by coating a photoresist on the target substrate provided from the drying unit. The drying unit includes a first vacuum unit which performs a vacuum treatment on the target substrate.