The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Dec. 08, 2022
Fujifilm Corporation, Tokyo, JP;
Masafumi Kojima, Haibara-gun, JP;
Akira Takada, Haibara-gun, JP;
Akiyoshi Goto, Haibara-gun, JP;
Takeshi Kawabata, Haibara-gun, JP;
Aina Ushiyama, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having a good shape can be obtained. Also provided is a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. Also provided is a compound which can be suitably used in the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, an acid-decomposable resin having a weight-average molecular weight of 30,000 or less, and a solvent, and the compound that generates an acid upon irradiation with actinic rays or radiation includes a compound (I).