The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

Sep. 23, 2020
Applicant:

Dexerials Corporation, Shimotsuke, JP;

Inventors:

Hiroshi Sugata, Shimotsuke, JP;

Hiroshi Tazawa, Shimotsuke, JP;

Shunichi Kajiya, Shimotsuke, JP;

Assignee:

Dexerials Corporation, Shimotsuke, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/02 (2006.01); G02B 1/11 (2015.01); G02B 1/118 (2015.01);
U.S. Cl.
CPC ...
G02B 1/118 (2013.01); G02B 1/11 (2013.01); G02B 5/0294 (2013.01);
Abstract

Provided is an anti-reflection structure with excellent anti-reflection performance and transparency, and with reduced generation of wrinkles on the surface. The present disclosure is an anti-reflection structureincluding at least an adhesion layerand an anti-reflection layerformed on the adhesion layerand having fine uneven structures on both sides thereof. The storage elastic modulus E' of the adhesion layeris equal to or greater than 25 MPa, and fine uneven structures formed on both sides of the anti-reflection layereach have an uneven period P equal to or less than the wavelength of visible light.


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