The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

Mar. 03, 2022
Applicant:

Sysmex Corporation, Kobe, JP;

Inventors:

Yuji Wakamiya, Kobe, JP;

Toru Uemura, Kobe, JP;

Yuichiro Ohmae, Kobe, JP;

Hidetaka Hayama, Kobe, JP;

Assignee:

SYSMEX CORPORATION, Kobe, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 35/00 (2006.01); B01L 3/00 (2006.01); G01N 1/44 (2006.01); G01N 33/48 (2006.01); G01N 33/96 (2006.01); G01N 35/02 (2006.01); G01N 35/10 (2006.01);
U.S. Cl.
CPC ...
G01N 35/00613 (2013.01); B01L 3/5025 (2013.01); G01N 1/44 (2013.01); G01N 33/96 (2013.01); G01N 35/00712 (2013.01); G01N 35/0092 (2013.01); G01N 35/02 (2013.01); G01N 35/10 (2013.01); B01L 2200/10 (2013.01); B01L 2300/0609 (2013.01); B01L 2300/0663 (2013.01); B01L 2300/1805 (2013.01); B01L 2300/1883 (2013.01); G01N 2035/00346 (2013.01);
Abstract

A quality control method of a specimen analysis system is disclosed, including: receiving a setting of a quality control measurement condition from a user; determining at least one quality control specimen to be used for quality control measurement from among a plurality of the quality control specimens stored in a storage, according to the quality control measurement condition and information on the quality control specimens that are stored in the storage section; taking out the determined quality control specimen from the storage; transporting the determined quality control specimen to a measurement unit; and measuring the transported quality control specimen by the measurement unit.


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Wakamiya, Yuji. (2026). Quality control method of specimen analysis system and specimen analysis system (U.S. Patent No. 12584934). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12584934

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