The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

Feb. 13, 2023
Applicants:

Tokyo Institute of Technology, Tokyo, JP;

Nof Corporation, Tokyo, JP;

Inventors:

Kazushi Kinbara, Tokyo, JP;

Tomoki Uruga, Tsukuba, JP;

Tomoyuki Ohtake, Tsukuba, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 65/333 (2006.01); A61K 47/60 (2017.01); C07C 217/28 (2006.01);
U.S. Cl.
CPC ...
C08G 65/33396 (2013.01); A61K 47/60 (2017.08); C07C 217/28 (2013.01);
Abstract

A method of producing a compound represented by formula (3): includes: step (1) of performing coupling of a monodispersed polyethylene glycol derivative represented by formula (4) shown below with a compound represented by formula (5) shown below using a base catalyst having a pKa in an aqueous solution of 15 to 20 to obtain a compound represented by formula (6) shown below, step (2) of deprotecting the protective group A of the compound represented by the formula (6) to obtain a compound represented by formula (7) shown below, and step (3) of subjecting the compound represented by the formula (7) to separatory purification; and step (4) of subjecting the compound represented by the formula (7) to deprotection treatment or reduction treatment to obtain the compound represented by formula (3), in an order described above, where Y, n, A, B, and Z are as defined herein:


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