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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12581911 B1

PDFFull Text
Date of Patent:
Mar. 17, 2026

Filed:

Sep. 20, 2022

Substrate processing apparatus

Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Kazuhiko Nakazawa, Kyoto, JP;

Toshihito Morioka, Kyoto, JP;

Hiromichi Kaba, Kyoto, JP;

Takashi Ota, Kyoto, JP;

Assignee:

SCREEN Holdings Co., Ltd., , JP;

Attorney:

OSTROLENK FABER LLP

Primary Examiner:

Binu Thomas

Int. Cl.
CPC ...
H01L 21/687 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68785 (2013.01); H01L 21/67017 (2013.01); H01L 21/67051 (2013.01); H01L 21/6708 (2013.01); H01L 21/6838 (2013.01); H01L 21/68735 (2013.01); H01L 21/6875 (2013.01); H01L 21/68792 (2013.01); H01L 21/68728 (2013.01);
Abstract

In a substrate holder, a gas supply part sends out a gas to the space between the lower surface of a substrate and a base surface of a base part to form a radially outward airflow. A division plate is arranged radially outward of the outer peripheral edge of the substrate on the base surface of the base part to surround the substrate. The inner peripheral edge of the division plate and the outer peripheral edge of the substrate face each other in the radial direction with a space in between. The upper surface of the division plate is located below or at the same position in the up-down direction as the upper surface of the substrate. An annular passage is provided between the lower surface of the division plate and the base surface of the base part.

Find Patent Forward Citations

Nakazawa, Kazuhiko. (2026). Substrate processing apparatus (U.S. Patent No. 12581911). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12581911

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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