The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Sep. 27, 2022
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Keiichi Yamaguchi, Ina, JP;

Hiyori Sakata, Minowa, JP;

Shigeru Shiraishi, Ina, JP;

Ryuta Nishizawa, Nagano, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10N 30/082 (2023.01); H10N 30/06 (2023.01); H03H 9/21 (2006.01);
U.S. Cl.
CPC ...
H10N 30/082 (2023.02); H10N 30/06 (2023.02); H03H 9/21 (2013.01);
Abstract

A method of manufacturing a vibration element includes: a first protective film forming step of forming a first protective film on a first substrate surface of a crystal substrate; a first dry etching step of dry-etching the crystal substrate via the first protective film; a second protective film forming step of forming a second protective film on a second substrate surface of the crystal substrate; and a second dry etching step of dry-etching the crystal substrate via the second protective film. A relationship of T<T<Tor T<T<Tis satisfied, in which Tand Tare thicknesses of the first and second protective films in an inter-arm region, respectively, Tand Tare thicknesses of the first and second protective films in first and second groove forming regions, respectively, and Tand Tare thicknesses of the first and second protective films in first and second bank portion forming regions, respectively.


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