The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Mar. 30, 2023
Applicant:

Vfc Group, Llc, North Salt Lake, UT (US);

Inventors:

Kirk Partridge, Park City, UT (US);

Todd Vought, Park City, UT (US);

Travis Vought, Salt Lake City, UT (US);

Assignee:

Lightning Protection Systems, LLC, North Salt Lake, UT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H02G 13/00 (2006.01); F16B 2/24 (2006.01); F16B 11/00 (2006.01); F16B 37/04 (2006.01); F16B 47/00 (2006.01); H02G 3/32 (2006.01); F16B 5/06 (2006.01);
U.S. Cl.
CPC ...
H02G 13/40 (2013.01); F16B 2/245 (2013.01); F16B 11/006 (2013.01); F16B 37/047 (2013.01); F16B 47/003 (2013.01); H02G 3/32 (2013.01); H02G 13/00 (2013.01); F16B 5/0685 (2013.01); Y10T 29/49117 (2015.01); Y10T 29/49826 (2015.01); Y10T 29/49869 (2015.01); Y10T 29/49947 (2015.01); Y10T 29/49966 (2015.01);
Abstract

An anchor for lightning protection systems includes a base and pad that extend over a sufficient area and a sufficient bearing length to hold in shear and in tension against the weight, shear force, and moment of cables, points, and other components of a lightning protection systems. A universal point mount may be forged to optimize cross sectional area and contact surface area throughout the mounting system. Drilled and tapped to receive a point oriented arbitrarily, the head mounts easily on a horizontal or vertical mounting surface. Apertures and fasteners provide arbitrary positioning of a point at any necessary orientation.


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