The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Dec. 09, 2020
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Yanjie Gao, Redmond, WA (US);
Haoxiang Lin, Redmond, WA (US);
Yu Liu, Redmond, WA (US);
Mao Yang, Redmond, WA (US);
Microsoft Technology Licensing, LLC, Redmond, WA (US);
Abstract
According to implementations of the subject matter described herein, there is provided a solution for predicting the resource usage of the deep learning model. In this solution, information about a deep learning model is obtained, the information comprising first information for describing the deep learning model and second information about an operating environment of a job associated with the deep learning model. The static resource usage of the job is determined based on the first information and a strategy of the job during runtime in the operating environment is determined. Afterwards, resource usage of the job during runtime in the operating environment is predicted based on the strategy and the static resource usage. With this solution, the usage of various resources of the deep learning model, such as computation power consumption, memory consumption, execution time, and the like, under a specific runtime strategy can be accurately predicted.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile