The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Dec. 11, 2023
Applicant:

Nikon Corporation, Tokyo, JP;

Inventors:

Masaki Kato, Yokohama, JP;

Hitoshi Mizuno, Yokohama, JP;

Yasushi Mizuno, Saitama, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G02B 26/0833 (2013.01);
Abstract

An exposure apparatus includes: an illumination optical system; a spatial light modulator; a projection optical system that illuminates an exposure target with light emitted from the spatial light modulator; and a stage where the exposure target is placed, wherein by the stage moving the exposure target in a predetermined scan direction, the light illuminates the exposure target by the projection optical system scans on the exposure target, the spatial light modulator includes a plurality of mirrors that rotates around a tilt axis extending in a direction orthogonal to both the scan and an optical axis directions of the projection optical system, the mirrors become an ON state by adjusting a tilt of each mirror relative to the scan direction and thereby emit light to the system, and the exposure apparatus includes an angle adjustment mechanism that adjusts a tilt angle of the spatial light modulator relative to the scan direction.


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