The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Feb. 04, 2022
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Inkyu Lee, Daejeon, KR;
Soonhwa Jung, Daejeon, KR;
Chulsuk Hong, Daejeon, KR;
Yeongrae Chang, Daejeon, KR;
Yeonhui Yi, Daejeon, KR;
Assignee:
LG CHEM, LTD., Seoul, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); C08L 83/12 (2006.01); G02B 1/04 (2006.01); G02B 5/32 (2006.01); G03F 7/033 (2006.01); G03F 7/038 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
G03F 7/001 (2013.01); C08L 83/12 (2013.01); G02B 1/04 (2013.01); G02B 5/32 (2013.01); G03F 7/033 (2013.01); G03F 7/038 (2013.01); G03F 7/0757 (2013.01);
Abstract
A photopolymer composition for hologram formation, comprising: a polymer matrix comprising a siloxane-based polymer and a (meth)acrylate polymer containing one or more reactive functional groups in the side chains, a holographic recording method, and an optical element are provided.