The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Mar. 08, 2024
Applicant:

Malvern Panalytical B.v., Almelo, NL;

Inventors:

Milen Gateshki, Almelo, NL;

Detlef Beckers, Almelo, NL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/207 (2018.01); G01N 23/20025 (2018.01);
U.S. Cl.
CPC ...
G01N 23/207 (2013.01); G01N 23/20025 (2013.01); G01N 2223/0563 (2013.01); G01N 2223/1016 (2013.01); G01N 2223/313 (2013.01); G01N 2223/501 (2013.01);
Abstract

The present invention relates to an X-ray analysis apparatus and an X-ray analysis method for analysing a sample. The X-ray analysis method involves using a first slit between the sample and a position sensitive X-ray detector to analyse the sample, including calculating a detection angle based on a distance Lbetween the first slit and the X-ray detector, and the position of the first detection element in the array of detection elements. The X-ray analysis apparatus comprises a processor that is configured to analyse data from an X-ray detector comprising an array of detection elements. The processor is configured to receive data comprising an X-ray intensity detected at the first detection element of the array of detection elements and calculate the detection angle based on the distance Lbetween the first slit and the X-ray detector, and the position of the first detection element in the array of detection elements.


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