The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Jan. 17, 2020
Applicant:
Lg Electronics Inc., Seoul, KR;
Inventors:
Jinsan Moon, Seoul, KR;
Wonbae Park, Seoul, KR;
Assignee:
LG ELECTRONICS INC., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/54 (2006.01); C23C 16/26 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/545 (2013.01); C23C 16/26 (2013.01); C23C 16/45561 (2013.01); C23C 16/45591 (2013.01);
Abstract
Discussed is a chemical vapor deposition apparatus that includes a reaction chamber with an open top and an open bottom, at least one inner partition wall can be in the reaction chamber and can divide an inner space of the reaction chamber in a height direction to form a plurality of division chambers. A heater can be further disposed at an outer surface of the reaction chamber, a plurality of upper winding rolls can be disposed above the reaction chamber, and at least one roller can be disposed below the reaction chamber.