The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Jan. 23, 2023
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Joaquin Aguilar Santillan, Gilbert, AZ (US);

Hong Gao, San Jose, CA (US);

Shanker Kuttath, Austin, TX (US);

Shaofeng Chen, Austin, TX (US);

Gary Urban Keppers, Morgan Hill, CA (US);

Felix Rabinovich, Scottsdale, AZ (US);

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22C 1/02 (2006.01); B22D 21/00 (2006.01); C22C 21/08 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
C22C 1/026 (2013.01); B22D 21/007 (2013.01); C22C 21/08 (2013.01); H01L 21/67167 (2013.01); H01L 21/6719 (2013.01); H01L 21/67196 (2013.01); H01L 21/67201 (2013.01); H01L 21/68707 (2013.01);
Abstract

A substrate handling chamber body is formed from a castable aluminum alloy including a manganese (Mn) constituent and an iron (Fe) constituent. The castable aluminum alloy has a manganese (Mn) constituent-to-iron (Fe) constituent ratio that between about 1.125 and about 1.525 to limit microporosity and shrinkage porosity within the castable aluminum alloy forming the substrate handling chamber body. Semiconductor processing systems and methods of making substrate handling chamber bodies for semiconductor processing systems are also described.


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