The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Sep. 17, 2021
Denka Company Limited, Tokyo, JP;
Denka Company Limited, Tokyo, JP;
Abstract
A method for manufacturing a chloroprene polymer composition, the method including: a polymerization step of polymerizing chloroprene in the presence of at least one rosin acid component selected from the group consisting of a rosin acid and a rosin acid salt to obtain a chloroprene polymer composition containing a chloroprene polymer, in which in the rosin acid component, a mass ratio B1/A1 of a total amount B1 of abietic acid, neoabietic acid, palustric acid, levopimaric acid, and salts thereof with respect to a total amount A1 of dehydroabietic acid, pimaric acid, isopimaric acid, dihydroabietic acid, and salts thereof is 0.10 to 3.00, and a toluene insoluble content of the chloroprene polymer is 50% by mass or more.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile