The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Apr. 28, 2022
Applicant:

The Regents of the University of Colorado, a Body Corporate, Denver, CO (US);

Inventors:

Robert R. Mcleod, Boulder, CO (US);

Charles M. Rackson, Boulder, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/393 (2017.01); A61C 7/08 (2006.01); B29C 64/124 (2017.01); B29C 64/241 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01); B33Y 80/00 (2015.01); B29L 31/00 (2006.01);
U.S. Cl.
CPC ...
B29C 64/393 (2017.08); A61C 7/08 (2013.01); B29C 64/124 (2017.08); B29C 64/241 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); B33Y 80/00 (2014.12); B29L 2031/753 (2013.01);
Abstract

Systems and methods for improved volumetric additive manufacturing (VAM) are described herein. In some aspects of the present disclosure, approaches to VAM image-computation are provided that algebraically optimizes directly on the structure to be printed, instead of on the set of external projection images. These approaches provide multiple advantages including improved reconstruction fidelity, simplicity, flexibility, and robust convergence to a desirable reconstruction, regardless of initial image-set guess.


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