The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2026
Filed:
Apr. 26, 2023
Samsung Electronics Co., Ltd., Suwon-si, KR;
Yoonyoung Jeon, Suwon-si, KR;
Youngmin Kim, Suwon-si, KR;
Joon Seok Oh, Suwon-si, KR;
Changbo Lee, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
An interconnection structure includes a first dielectric layer, a second dielectric layer, first wiring patterns, and a first conductive pattern. The first wiring patterns respectively include a first penetration part that extends into a surface of the first dielectric layer, a first intervention part on the first penetration part and in the second dielectric layer, and a first connection part on the first intervention part and in the second dielectric layer. A top surface of the first intervention part is at a same level as a top surface of the first conductive pattern relative to the surface of the first dielectric layer. An angle between a sidewall of the first connection part and the top surface of the first intervention part is greater than that between a sidewall of the first penetration part and a bottom surface of the first dielectric layer.