The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Oct. 28, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Jungmin Park, Seoul, KR;

Hanjin Lim, Seoul, KR;

Hyungsuk Jung, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 1/68 (2025.01); H10B 53/10 (2023.01); H10B 53/30 (2023.01);
U.S. Cl.
CPC ...
H10D 1/684 (2025.01); H10B 53/10 (2023.02); H10B 53/30 (2023.02);
Abstract

A semiconductor device includes a capacitor structure. The capacitor structure includes a bottom electrode, a dielectric layer, and a top electrode that are sequentially stacked in a first direction. The dielectric layer includes first dielectric layers and second dielectric layers interposed between the bottom electrode and the top electrode and are that are alternately stacked in the first direction. The first dielectric layers include a ferroelectric material, and the second dielectric layers include an anti-ferroelectric material. A lowermost second dielectric layer is interposed between a lowermost first dielectric layer and the bottom electrode, and an uppermost second dielectric layer is interposed between an uppermost first dielectric layer and the top electrode.


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