The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Dec. 16, 2022
Applicant:

Microsoft Technology Licensing, Llc, Redmond, WA (US);

Inventors:

Kathryn M. Oseen-Senda, Seattle, WA (US);

Martha Geoghegan Peterson, Woodinville, WA (US);

Dennis Trieu, Calgary, CA;

Alexis Grace Schubert, Seattle, WA (US);

Eric C. Peterson, Woodinville, WA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05K 7/20 (2006.01); B01D 5/00 (2006.01); B01D 53/00 (2006.01); B01D 53/04 (2006.01); B01D 53/26 (2006.01);
U.S. Cl.
CPC ...
H05K 7/203 (2013.01); B01D 5/0003 (2013.01); B01D 5/0051 (2013.01); B01D 5/0057 (2013.01); B01D 53/002 (2013.01); B01D 53/0438 (2013.01); B01D 53/0446 (2013.01); B01D 53/0454 (2013.01); B01D 53/261 (2013.01); H05K 7/20318 (2013.01); H05K 7/20327 (2013.01); H05K 7/20818 (2013.01); B01D 53/0462 (2013.01); B01D 2257/80 (2013.01); B01D 2259/4009 (2013.01); B01D 2259/40092 (2013.01);
Abstract

A vapor recovery system comprises an inlet located at a first end of a fluid path configured to receive a fluid vapor to the vapor recovery system. The vapor recovery system comprises a condenser located on the fluid path and a scrubber located on the fluid path. The vapor recovery system comprises a composition sensor located on the fluid path between the scrubber and a second end of the fluid path. The composition sensor is configured to measure a composition of the fluid vapor. The vapor recovery system comprises an exhaust located at the second end of the fluid path configured to exhaust at least a portion of the fluid vapor from the fluid path at a composition having an amount of a working fluid below a working fluid threshold.


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